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PROGRAMME AND PRESENTATIONS FORMAT

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TECHNICAL PROGRAMME

08:30 Tutorials Registration
09:00-17:30 Tutorials
16:00-18:00 Registration

08:00 Registration
09:00 Openings
  Mo-1 Plenary
9:20 INVITED: Thick epitaxial layers growth by chlorine addition | La Via Francesco
9:50 INVITED: Perspectives of SiC power devices in highly efficient renewable energy conversion systems | Zacharias Peter
10:20 Coffee
  Mo-2 Defects 1
10:50 INVITED: The Silicon vacancy in SiC | Janzen Erik
11:20 Pulsed EPR Studies of the Tv2a center in 4H-SiC | Isoya Junichi
11:40 Antisite pairs identified as dominant irradiation induced defects in 4H-SiC | Gerstmann Uwe
12:00 Identification of the di-carbon antisite defect in n-type 4H-SiC | Gali Adam
12:20 Characterization of screw dislocations in a 4H-silicon carbide diode | Tanuma Ryohei
12:40 Lunch
13:45 Mo-P Poster Session I
  Invited poster: Fast epitaxial growth of 4H-SiC and analysis of defect transfer | Tsuchida Hidekazu
  Invited poster: Spatial profiling of planar defects in 4H-SiC epilayers using micro-photoluminescence mapping | Feng Gan
  Mo-3 Defects 2
15:45 INVITED: Nanocharacterisation of SiC related materials, structures and devices:
beyond structural imaging to charge transport and physical parameters determination | Raineri Vito
16:15 Deep levels generated by ion-implantation in n- and p-type 4H-SiC | Kawahara Kotaro
16:35 Interstitial defects introduced by electron-irradiation at 77 K in SiC | Nguyen Son
16:55 The influence of growth conditions on the annealing of irradiation induced EH6,7 defects in 4H-SiC | Pintilie Ioana
17:15 Defects in fast chloride-based 4H-SiC epitaxy | Beyer Franziska
17:35 End
19:00 Welcome Reception

  Tu-1 Cubic SiC
08:30 INVITED: Unseeded sublimation growth of high quality 3C-SiC single | Chaussende Didier
9:00 High Quality Single Crystal 3C-SiC(111) Films Grown on Si | Locke Christopher
9:20 Role of Substrate Disorientation in Relaxation of 3C-SiC Layers | Zielinski Marcin
9:40 Towards large area (111) 3C-SiC films grown on off-oriented (111) Si substrates | Severino Andrea
10:00 Study on the Precipitation of 3C/4H From a Liquid Phase | Kim-Hak Olivier
10:20 Coffee
  Tu-2 Graphene on SiC
10:50 INVITED: Atomic and electronic structure of epitaxial graphene on SiC: the STM approach | Mallet Pierre
11:20 Growth of Graphene Layers on Silicon Carbide | Strupinski Wlodek
11:40 Raman and Electrical Investigation of Heteroepitaxial Graph N/A | Shivaraman Shriram
12:00 Quality control of graphene layers grown on SiC | Camara Nicolas
12:20 Study of electrical characteristics of the CNT/SiC interface | Perrone Denis
12:40 Lunch
13:45 Tu-P Poster Session II
  Tu-3 Bulk and Epi growth
15:45 INVITED: Basal plane dislocation mitigation in 8 degree off-cut 4H-SiC through in situ growth interrupts during chemical vapor deposition | VanMil Brenda
16:15 Defect Control in SiC Manufacturing | Berkman Elif
16:35 On-axis Homoepitaxy on Full 2" Wafer for High Power Applications | Hassan Jawad
16:55 Chloride-based SiC epitaxial growth | Pedersen Henrik
17:15 Atomistic and continuum simulations of the homo-epitaxial growth | Massimo Camarda
17:35 Coffee
  Tu-4 Industrial Session
18:00 Industry News from TranSiC, TankeBlue, Yoli and CREE Inc.
19:00 End

  We-1 Reliability
8:50 INVITED: Comparative analysis of SiC power device structures | Wright Nick
9:20 Electrical Characterization of MOS Structures with Deposited Oxides Annealed in N2O or NO | Grieb Michael
9:40 300ºC SiC Blocking Diodes for Solar Array Strings | Brosselard Pierre
10:00 Impact of Carbon Cap Annealing on Gate Oxide Reliability on 4H-SiC (000-1) C-face | Harada Shinsuke
10:20 Channel Hot-Carrier Effect of 4H-SiC MOSFET | Yu Liangchun
10:40 Coffee
  We-2 Surface and Interface
11:10 Hydrogen Adsorption and Etching on a Si-rich SiC Surface | Deak Peter
11:30 Atomistic Scale Modeling and Analysis of Sodium Enhanced Oxidation of Silicon Carbide | Chatterjee Aveek
11:50 Interface States in MOS Capacitors: a Comparative Study Between Conductance Spectroscopy and Thermal Dielectric Relaxation Current Technique | Lars Sundnes Løvlie
12:10 Characterization of the SiO2/SiC interface with Impedance Spectroscopy | Sobas Pawel
12:30 Lunch
13:45 We-P Poster Session III
  We-3 Power MOSFETs
15:45 INVITED: Development of high-performance SiC MOSFETs | Nakamura Takashi
16:15 Implications of threshold voltage instability on SiC DMOSFET operation | Lelis Aivars
16:35 Reliability of Large Area Gate Oxide on the C-face of 4H-SiC | Hatakeyama Tetsuo
16:55 Improved On-Current of 4H-SiC MOSFET with a Three-Dimensional Gate Structure |Nanen Yuichiro
17:15 Performance of 60A, 1200V 4H-SiC DMOSFETs | B. A. Hull
17:35 End
20:00 Gala Dinner

  Th-1 Device Processing
8:50 INVITED: Polycrystalline and monocrystalline SiC devices in Space applications | Berberich Stefan
9:20 Heat-resistant Ni2Si-based contacts on SiC connected to Si-doped Al interconnect via Ta/TaN barrier | Tanimoto Satoshi
9:40 Effects of N implantation on the performance of 4H-SiC MOSFET | Poggi Antonella
10:00 AlON/SiO2 stacked gate dielectrics for 4H-SiC MIS devices | Hosoi Takuji
10:20 Positive Temperature Coefficient of Avalanche Breakdown Observed in a-Plane 6H-SiC Photodiodes | Soloviev Stanislav
10:40 Coffee
  Th-2 Unipolar and Bipolar Devices
11:10 A New High Current Gain 4H-SiC Bipolar Junction Transistor With Suppressed Surface Recombination Structure: SSR-BJT | Nonaka Kenichi
11:30 Assessment of high and low temperature performance of SiC BJTs | Nawaz Muhammad
11:50 VJFET based all-SiC Normally-Off Cascode Switch for High Temperature Power Handling Applications | Veliadis Victor
12:10 Characterization and Modeling of SiC LTJFET for Analog Integrated Circuit Simulation and Design | Maralani Hamid
12:30 Lunch
  Th-3 Applications and Future Perspectives
13:40 INVITED: Critical Issues for MOS Based Power Devices in 4H-SiC | Ryu Sei-Hyung
14:10 Comparison of SiC-JFET and Si-IGBT inverter losses | Koch Immo
14:30 Ultra Low Noise Epitaxial 4H-SiC X-Ray Detectors | Bertuccio Giuseppe
14:50 Bio-interfacing with SiC | Sharp Ian
15:10 Closing Session
15:30 End